The Impact of Off-Axis Illumination on the Optimization of the 250–350 nm Projection Photolithography Process
https://doi.org/10.35596/1729-7648-2026-24-2-37-45
Abstract
With increasing integration density and decreasing feature sizes, there is a need to optimize photolithography processes. Off-axis illumination is effective in increasing the resolution and depth of focus of lenses in projection equipment operating in the UV range using mercury-vapor discharge lamps. Off-axis illumination reduces diffraction limitations and improves resolution within design limits of approximately 250–350 nm. This article presents the results of a comprehensive analysis of methods for developing and optimizing off-axis illumination systems in projection photolithography. A method for simulating off-axis ring illumination for systems lacking standard resolution enhancement systems is proposed and tested. The effectiveness and adequacy of this method are confirmed by experimental studies.
About the Authors
A. Zakharevich
JSC “INTEGRAL” – Manager Holding Company “INTEGRAL”; Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Zakharevich Andrei, Leading Engineer; Master Sci. (Tech.), Postgraduate of the Department of Electronic Engineering and Technology
220108, Minsk, Kazintsa St., 121a
Tel.: +375 29 572-01-78
I. Lovshenko
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Head of the Research Laboratory “CAD in Micro- and Nanoelectronics” (Lab 4.4)
Minsk
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Review
For citations:
Zakharevich A., Lovshenko I. The Impact of Off-Axis Illumination on the Optimization of the 250–350 nm Projection Photolithography Process. Doklady BGUIR. 2026;24(2):37-45. (In Russ.) https://doi.org/10.35596/1729-7648-2026-24-2-37-45
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