ANALYTICAL SOLUTION OF EQUATIONS SET DESCRIBING DIFFUSION OF POINT DEFECTS IN THE 2-LAYER SEMICONDUCTOR STRUCTURE
Abstract
About the Authors
O. I. VelichkoBelarus
V. V. Aksenov
Belarus
References
1. Kononchuk O., Nguye B.-Y. Silicon-On-Insulator (SOI) Technology: Manufacture and Applications. Elsevier, 2014. 496 p.
2. SiGe HBT Technology Based on a 0.13-μm Process Featuring an fMAX of 325 GHz // IEEE Journal of the Electron Devices Society / T. Hashimoto [et al.]. 2014. Vol. 2, No. 4. P. 50-58.
3. Behera P., Mohapatra S.K. A Comparative Study on SiGe HBTs and Si BJTs in Nanoscale // International Journal of Advanced Science and Technology. 2014. Vol. 71. P. 59-66.
4. Chebotin V.N. The physical chemistry of the solid state. M.: Khimiia, 1982. 320 p.
5. Fichtner W. Process simulation // VLSI Technology / Ed. S.M. Sze. McGraw-Hill International Book Company, 1983. P. 385-444.
6. Velichko O.I. Solutions of diffusion equation for point defects // Journal of Mathematical Modeling. 2016. Vol. 4, № 2. P. 187-210.
7. Pichler P. Intrinsic point defects, impurities and their diffusion in silicon. Wien, New York: Springer, 2004. 536 p.
Review
For citations:
Velichko O.I., Aksenov V.V. ANALYTICAL SOLUTION OF EQUATIONS SET DESCRIBING DIFFUSION OF POINT DEFECTS IN THE 2-LAYER SEMICONDUCTOR STRUCTURE. Doklady BGUIR. 2017;(7):20-24. (In Russ.)