The Influence of Cleaning Parameters in High-Density Argon Plasma on the Morphology and Surface Properties of Monocrystalline Silicon Substrates

K. Logunov; A. Mikholap

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Logunov K., Mikholap A. The Influence of Cleaning Parameters in High-Density Argon Plasma on the Morphology and Surface Properties of Monocrystalline Silicon Substrates. Doklady BGUIR. 2026;24(3):44-51. (In Russ.) https://doi.org/10.35596/1729-7648-2026-24-3-44-51

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ISSN 1729-7648 (Print)
ISSN 2708-0382 (Online)

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