The Impact of Off-Axis Illumination on the Optimization of the 250–350 nm Projection Photolithography Process

A. Zakharevich; I. Lovshenko

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Zakharevich A., Lovshenko I. The Impact of Off-Axis Illumination on the Optimization of the 250–350 nm Projection Photolithography Process. Doklady BGUIR. 2026;24(2):37-45. (In Russ.) https://doi.org/10.35596/1729-7648-2026-24-2-37-45

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ISSN 1729-7648 (Print)
ISSN 2708-0382 (Online)

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