The Influence of Cleaning Parameters in High-Density Argon Plasma on the Surface Morphology of Glass Substrates and the Characteristics of the Emission Spectrum
https://doi.org/10.35596/1729-7648-2025-23-6-24-30
Abstract
The influence of cleaning parameters in high-density inductively coupled argon plasma on the surface morphology of glass substrates and the characteristics of their optical emission spectrum was studied. Cleaning was performed with RF source power ranging from 100 to 2000 W and durations of up to 150 s. Surface morphology was analyzed using atomic force microscopy, and plasma diagnostics were provided by optical emission spectroscopy. It was established that cleaning parameters at a discharge power of 300 W and duration of 60 s ensure minimal surface roughness and contaminant removal without surface damage. Spectral analysis revealed an increase in the intensity of argon atomic lines with increasing power and gas flow rate, reflecting an increase in excited particle density and electron temperature. The obtained dependencies can be used for automated monitoring and adjustment of plasma cleaning regimes in technological processes.
About the Author
K. T. Logunov
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Logunov Konstantin Timofeevich, Postgraduate at Micro- and Nanoelectronics Department, Belarusian State University of Informatics and Radioelectronics
220013, Minsk, P. Brovki St., 6
Теl.: +375 17 293-22-63
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Review
For citations:
Logunov K.T. The Influence of Cleaning Parameters in High-Density Argon Plasma on the Surface Morphology of Glass Substrates and the Characteristics of the Emission Spectrum. Doklady BGUIR. 2025;23(6):24-30. (In Russ.) https://doi.org/10.35596/1729-7648-2025-23-6-24-30
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