Effect of Heat Treatment on the Resistive and Structural Properties of Vanadium Oxide Films
https://doi.org/10.35596/1729-7648-2026-24-5-15-23
Abstract
The effect of heat treatment (annealing) conditions in the range of 200–400 °C on the electrical resistivity, temperature coefficient of resistance, phase composition and structure of vanadium oxide films with a thickness of (100 ± 5) nm deposited on oxidized silicon substrates by pulsed magnetron sputtering has been studied. It has been found that annealing films at 200–275 °C in an environment of N2 or O2 makes it possible to form films with a linear dependence of resistivity on temperature in the range from 0.4 to 1.6 Ohm×cm with a temperature coefficient of resistance from –1.7 to –2.0 %/°C. Such films can be used in microbolometers with an operating temperature range of 25–85 °C. Annealing of films at 400 °C in an O2 medium leads to a hysteresis dependence of their resistivity on temperature in the range from 0.9 to 2.9 Ohm×cm, with an absolute value of the temperature coefficient of resistance of 3.2–3.4 %/°C. The studied resistive properties are determined by the presence and quantitative ratio of the crystalline phases VO2, V2O5, and VOx formed during annealing.
About the Authors
A. Zanka
JSC “INTEGRAL” Manager Holding Company “INTEGRAL”
Belarus
Belarus
Zanka Andrei, Head of Laboratory Sector Tel.: +375 25 762-16-04
220108, Minsk, Korzhenevskogo St., 16
D. Kotov
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Kotov D., Cand. Sci. (Tech.), Associate Professor, Associate Professor at the Department of Microand Nanoelectronics
Minsk
Ja. Solovjov
JSC “INTEGRAL” Manager Holding Company “INTEGRAL”
Belarus
Belarus
Solovjov Ja., Dr. Sci. (Tech.), Associate Professor, Head of Laboratory
Minsk
K. Logunov
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Logunov K., Deputy Dean of the Faculty of Radio Engineering and Electronics
Minsk
O. Charnavusik
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Charnavusik O., Senior Lecturer
Minsk
N. Kovalchuk
JSC “INTEGRAL” Manager Holding Company “INTEGRAL”
Belarus
Belarus
Kovalchuk N. , Cand. Sci (Tech.), Associate Professor, Deputy General Director Chief Engineer
Minsk
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Review
For citations:
Zanka A., Kotov D., Solovjov J., Logunov K., Charnavusik O., Kovalchuk N. Effect of Heat Treatment on the Resistive and Structural Properties of Vanadium Oxide Films. Doklady BGUIR. 2026;24(5):15-23. (In Russ.) https://doi.org/10.35596/1729-7648-2026-24-5-15-23
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