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Multilayer Memory Elements Al-Al<2>текстTe3-SnTe-TeO2-SnTe-Me

https://doi.org/10.35596/1729-7648-2026-24-4-47-53

Abstract

This article presents a study of the physical processes at the interface in thin-film structures based on two- and three-component chalcogenides, which determine the mechanisms of phase transitions and memory. An alternative concept for resistive threshold switching at the interfaces of two- and three-component chalcogenide semiconductor materials is proposed, resulting in the formation of metastable dichalcogenide compounds. Methods for the structural stabilization of such compounds are discussed.

About the Authors

Ye. Troyan
Belarusian State University of Informatics and Radioelectronics
Belarus

Troyan Ye., Сand. Sci. (Tech.), Associate Professor of the Department of Micro- and Nanoelectronics

220013, Minsk, P. Brovki St., 6



A. Smirnov
Belarusian State University of Informatics and Radioelectronics
Belarus

Smirnov A., Dr. Sci. (Tech.), Honorary Professor, Head of the Laboratory of Information Processing and Display Devices

220013, Minsk, P. Brovki St., 6



A. Stepanov
1Belarusian State University of Informatics and Radioelectronics
Belarus

Stepanov A., Сand. Sci. (Tech.), Associate Professor of the Department of Micro- and Nanoelectronics

220013, Minsk, P. Brovki St., 6



S. Kharkov
Belarusian State University of Informatics and Radioelectronics
Belarus

Kharkov S., Postgraduate of Micro- and Nanoelectronics Department

220013, Minsk, P. Brovki St., 6



E. Koroleva
A. F. Ioffe Physical-Technical Institute
Russian Federation

Koroleva E., Сand. Sci. (Phys. and Math.), Senior Researcher

Saint Petersburg



A. Filimonov
Peter the Great St. Petersburg Polytechnic University
Russian Federation

Filimonov A., Dr. Sci. (Phys. and Math.), Professor

Saint Petersburg



References

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Review

For citations:


Troyan Ye., Smirnov A., Stepanov A., Kharkov S., Koroleva E., Filimonov A. Multilayer Memory Elements Al-Al<2>текстTe3-SnTe-TeO2-SnTe-Me. Doklady BGUIR. 2026;24(4):47-53. (In Russ.) https://doi.org/10.35596/1729-7648-2026-24-4-47-53

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ISSN 1729-7648 (Print)
ISSN 2708-0382 (Online)