For citations:
Koval’chuk N.S., Demidovich S.A., Vlasukova L.A., Parkhomenko I.N. Deposition of SiNx Films with Controlled Residual Stress from SiH4-NH3-He Gaseous Mixture in Inductively Coupled Plasma. Doklady BGUIR. 2024;22(1):5-12. (In Russ.) https://doi.org/10.35596/1729-7648-2024-22-1-5-12