Model of Reactive Magnetron Sputtering of a Two-Component Composite Target
https://doi.org/10.35596/1729-7648-2023-21-3-17-25
Abstract
The article proposes a model for predicting the content of metal components of complex oxide films deposited by reactive magnetron sputtering of a two-component composite target in Ar/O2 gas mixture. The model takes into account the sputtering yield and ion-electron emission coefficients of the sputtered metals and their oxides, the distribution of the ion current density on the target, and the rate of the chemical reaction of the formation of oxides of these metals. To verify the proposed model, studies of the elemental composition of titanium-aluminum oxide films deposited by magnetron sputtering of a Ti-Al composite target in Ar and Ar/O2 gas mixture were carried out. It has been established that the model adequately describes the change in the content of metals in the deposited films with a change in the oxygen flow into the chamber. The simulation error does not exceed 10 %, this makes it possible to use the proposed model for predicting the content of metals in a film during reactive sputtering of two-component composite targets.
Keywords
reactive magnetron sputtering,
composite target,
thin films,
elemental composition,
reactive sputtering model,
titanium-aluminum oxide
Supporting agencies: The research was carried out within the framework of joint scientific projects No T22KITG-023 (2022YFE0123400) and No T22KITG-027 (2022YFE0122900) with the financial support of the Belarusian Republican Foundation for Basic Research and the Ministry of Science and Technology of the People’s Republic of China
About the Authors
H. T. Doan
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Doan H. T., Postgraduate
Minsk
D. A. Golosov
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Golosov Dmitriy Anatol’evich, Cand. of Sci., Associate Professor, Senior Researcher at the Center of Electronic Technologies andTechnical Diagnosis of Technological Media and Solid State Structures (Center 2.1) of R&D Department
220013, Minsk, P. Brovki St., 6
Tel.: +375 17 293-80-79; E-mail: dmgolosov@mail.ru
Jin Zhang
Xi’an Polytechnic University
China
China
Jin Zhang, Cand. of Sci., Researcher at the Shaanxi Province Key Laboratory of Thin Films Technology and Optical Test
Xi’an
S. M. Zavadski
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Zavadski S. M., Cand. of Sci., Associate Professor, Head of the Center 2.1 of R&D Department
Minsk
S. N. Melnikov
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Melnikov S. N., Cand. of Sci., Senior Researcher at the Center 2.1 of R&D Department
Minsk
T. D. Nguyen
Le Quy Don Technical University
Viet Nam
Viet Nam
Nguyen T. D., Cand. of Sci., Lecture
Hanoi
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Review
For citations:
Doan H.T., Golosov D.A., Zhang J., Zavadski S.M., Melnikov S.N., Nguyen T.D. Model of Reactive Magnetron Sputtering of a Two-Component Composite Target. Doklady BGUIR. 2023;21(3):17-25. (In Russ.) https://doi.org/10.35596/1729-7648-2023-21-3-17-25
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