Resistor Model of Layered Film Structures
https://doi.org/10.35596/1729-7648-2023-21-2-14-20
Abstract
Electric properties of film structures consisting of two-dimensional layers, composed by nanocrystalline grains of a semiconductor are proposed to be modeled with an equivalent scheme, in which resistors indicate electrical resistance of current channels in metallic contacts, grain material, potential barriers between grains and layers. Numerical simulation within the model has shown that there is a nonuniform current distribution over the area of the contacts. Current density at their edges can be 3–6 times higher than in the center. Local currents and their distribution in the film bulk are determined by the grain structure of the film, number of the layers, electronic properties of the barriers between grains and layers.
About the Authors
Tung Pham VanBelarus
Van Tung Pham Postgraduate at the Department of Micro- and Nanoelectronics
220013, Minsk, P. Brovki St., 6
E. B. Chubenko
Belarus
Cand. of Sci., Associate Professor, Associate Professor at the Department of Micro and Nanoelectronics
V. E. Borisenko
Belarus
Dr. of Sci. (Phys. and Math.), Professor, Professor at the Department of Micro- and Nanoelectronics
References
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Review
For citations:
Van T., Chubenko E.B., Borisenko V.E. Resistor Model of Layered Film Structures. Doklady BGUIR. 2023;21(2):14-20. (In Russ.) https://doi.org/10.35596/1729-7648-2023-21-2-14-20