Use of Laser Interferometry to Determine the End Time of the Plasma-Chemical Etching of p-GaN and AlGaN Layers of the p-GaN/AlGaN/GaN Heterostructure with Two-Dimensional Electron Gas

A. D. Yunik; A. H. Shydlouski

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Yunik A.D., Shydlouski A.H. Use of Laser Interferometry to Determine the End Time of the Plasma-Chemical Etching of p-GaN and AlGaN Layers of the p-GaN/AlGaN/GaN Heterostructure with Two-Dimensional Electron Gas. Doklady BGUIR. 2022;20(7):12-19. (In Russ.) https://doi.org/10.35596/1729-7648-2022-20-7-12-19

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ISSN 1729-7648 (Print)
ISSN 2708-0382 (Online)

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