For citations:
Tsikhan O.I., Madveika S.I., Bordusau S.V., Barakhoev A.L., Kamlach P.V. Study of the influence of ozone-air mixture supply conditions on the process of the photoresist removal from the silicon wafer surface. Doklady BGUIR. 2020;18(6):57-65. (In Russ.) https://doi.org/10.35596/1729-7648-2020-18-6-57-65