CALIBRATION OF THE SYSTEM USED FOR CONDUCTOR INSPECTION AT MICROCHIP SUBSTRATE
Abstract
The article describes the calibration method of the photometric system for a particular purpose of estimation position of the conductor connecting the semiconductor chip and the substrate. A nonlinear model of the camera lens distortion, which allows estimating the position of the conductor in a three-dimensional space with the required accuracy is described. The novelty of the described technique is to provide the required accuracy of conductor parameters measurement with a high processing speed.
About the Author
I. N. Gubchik
Белорусский государственный университет информатики и радиоэлектроники
Belarus
Belarus
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Review
For citations:
Gubchik I.N. CALIBRATION OF THE SYSTEM USED FOR CONDUCTOR INSPECTION AT MICROCHIP SUBSTRATE. Doklady BGUIR. 2013;(6):92-97. (In Russ.)
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