LED ULTRAVIOLET EXPOSURE UNIT WITH ADJUSTABLE EXPOSURE TIME
https://doi.org/10.35596/1729-7648-2019-125-7-46-50
Abstract
The possibilities of improving the quality of the topological pattern in the exposure of thick-film photoresists due to uniform irradiation with ultraviolet light-emitting diodes are investigated. The results of an experimental study of the developed LED ultraviolet photolithographic irradiator with a controlled exposure time are presented.
About the Authors
A. E. CheliapinBelarus
Chelyapin Alexey Evgenievich, PG student, researcher
220090, Republic of Belarus, Minsk, Logoisk tr., 20
tel.+375-29-673-65-92
P. S. Begunov
Belarus
PG student, researcher
Y. V. Trofimov
Belarus
PhD., director
G. K. Zhavnerko
Belarus
PhD.
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Review
For citations:
Cheliapin A.E., Begunov P.S., Trofimov Y.V., Zhavnerko G.K. LED ULTRAVIOLET EXPOSURE UNIT WITH ADJUSTABLE EXPOSURE TIME. Doklady BGUIR. 2019;(7 (125)):46-50. (In Russ.) https://doi.org/10.35596/1729-7648-2019-125-7-46-50