POROUS ANODISATION OF ALUMINUM FILMS WITH PHOTOLITOGRAPHIC MASK UNDER HIGH FORMING VOLTAGES
Abstract
About the Author
S. K. LazaroukBelarus
References
1. Юнг Л. Анодные оксидные пленки. Ленинград, 1961
2. Chu S., Wada K., Inoue S. et. al. // Adv. Mater. 2005. Vol. 17. P. 2115.
3. Lazarouk S., Sasinovich D., Borisenko V. et. al. // J. of Applied Physics. 2010. Vol. 107. P. 033527-1-5.
4. Lazarouk S., Baranov I, Maello G. et. al. // J. of Electrochemical Society. 1994. Vol. 141. P. 2556-2559.
5. Lazarouk S., Katsouba S., Leshok A. et. al.// Microelectronic Engineering. 2000. Vol. 50, № 1-4. P. 321-327.
6. Lazarouk S., Katsouba S., Demianovich A. et. al. // Solid-State Electronics. 2000. Vol. 44. P. 815-818.
7. Lee W// Corrosion 2010. Vol. 62. № 6. P. 57-63.
Review
For citations:
Lazarouk S.K. POROUS ANODISATION OF ALUMINUM FILMS WITH PHOTOLITOGRAPHIC MASK UNDER HIGH FORMING VOLTAGES. Doklady BGUIR. 2013;(3):52-57. (In Russ.)