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Memristor Effect in Layered Film Structures

https://doi.org/10.35596/1729-7648-2024-22-3-5-13

Abstract

Equivalent  electrical  circuits  of  multilayer  film  structures  with  memristor  switching  of  resistance at   interlayer boundaries and at the boundaries of crystal grains in each layer are proposed. Numerical modeling of   the  current-voltage characteristics of such structures has shown that their loop-shaped form, typical of memristors, is transformed into a linear ohmic dependence of the total current on the magnitude of the applied external voltage as both the number of layers and the number of grains in each layer increase. A certain combination of the  number of layers and grains in a layer has been established, at which the maximum total current flowing through the structure and the ratio of resistances in the “off” and “on” states reach the highest values.

About the Authors

V. T. Pham
Belarusian State University of Informatics and Radioelectronics (BSUIR)
Belarus

Pham Van Tung, Postgraduate at the Department of Micro- and  Nanoelectronics

220013, Minsk, P. Brovki St., 6

Tel.: +375 17 293-88-75

 



D. A. Podryabinkin
Belarusian State University of Informatics and Radioelectronics (BSUIR)
Belarus

Cand. of Sci., Senior Researcher at  the  Department  of  Micro-  and  Nanoelectronics

220013, Minsk, P. Brovki St., 6 



E. B. Chubenko
Belarusian State University of Informatics and Radioelectronics (BSUIR)
Belarus

Cand. of Sci., Associate Professor, Associate  Professor  at the  Department  of  Micro- and Nanoelectronics

220013, Minsk, P. Brovki St., 6 



V. E. Borisenko
Belarusian State University of Informatics and Radioelectronics (BSUIR)
Belarus

Dr.  of  Sci.  (Phys.  and  Math.), Professor,  Professor  at the  Department  of  Micro- and Nanoelectronics

220013, Minsk, P. Brovki St., 6 



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Review

For citations:


Pham V., Podryabinkin D.A., Chubenko E.B., Borisenko V.E. Memristor Effect in Layered Film Structures. Doklady BGUIR. 2024;22(3):5-13. (In Russ.) https://doi.org/10.35596/1729-7648-2024-22-3-5-13

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ISSN 1729-7648 (Print)
ISSN 2708-0382 (Online)