Plasma Systems in Thin Film Technology
https://doi.org/10.35596/1729-7648-2024-22-2-20-31
Abstract
The article discusses the current trends in the development of ion-plasma systems for ion processing and thin film deposition. Application of pulsed reactive magnetron sputtering for deposition of vanadium oxide films and dependence of process parameters on power supply frequency characteristics, peculiarities and application of direct ion-beam deposition for formation of coatings based on SiO2 for optical coatings, SiO2, CH, CN, CHF for orientation coatings of LCD displays, wear-resistant coatings of diamond-like carbon (α-C) and carbon nitride (CNx) are considered. The advantages of continuous microwave magnetron power over pulsed mode are shown. The mathematical model for calculating magnetron sputtering systems, processes of magnetron sputtering and the main capabilities of the developed software complex Deposition are shown.
About the Authors
A. P. Dostanko
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Academician at the National Academy of Sciences of Belarus, Dr. of Sci. (Tech.), Professor, Principal Researcher at the Center “Ion Plasma Systems and Technologies” (Center 2.1) of R&D Department, Belarusian State University of Informatics and Radioelectronics
S. I. Madveyko
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Cand. of Sci., Associate Professor, Head of the Department of Electronic Engineering and Technology
E. V. Telesh
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Senior Lecturer at the Department of Electronic Engineering and Technology
S. N. Melnikov
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Cand. of Sci., Senior Researcher at the Center 2.1 of R&D Department
S. M. Zavadski
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Zavadski Sergey Mikhaylovich, Cand. of Sci., Associate Professor, Head of the Center 2.1 of R&D Department
220013, Minsk, P. Brovki St., 6
Tel.: +375 17 293-80-79
D. A. Golosov
Belarusian State University of Informatics and Radioelectronics
Belarus
Belarus
Cand. of Sci., Associate Professor, Senior Researcher at the Center 2.1 of R&D Department
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Review
For citations:
Dostanko A.P., Madveyko S.I., Telesh E.V., Melnikov S.N., Zavadski S.M., Golosov D.A. Plasma Systems in Thin Film Technology. Doklady BGUIR. 2024;22(2):20-31. (In Russ.) https://doi.org/10.35596/1729-7648-2024-22-2-20-31
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