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LED ULTRAVIOLET EXPOSURE UNIT WITH ADJUSTABLE EXPOSURE TIME

https://doi.org/10.35596/1729-7648-2019-125-7-46-50

Abstract

The possibilities of improving the quality of the topological pattern in the exposure of thick-film photoresists due to uniform irradiation with ultraviolet light-emitting diodes are investigated. The results of an experimental study of the developed LED ultraviolet photolithographic irradiator with a controlled exposure time are presented.

About the Authors

A. E. Cheliapin
Center of LED and Optoelectronic Technologies of National Academy of Sciences of Belarus
Belarus

Chelyapin Alexey Evgenievich, PG student, researcher

220090, Republic of Belarus, Minsk, Logoisk tr., 20

tel.+375-29-673-65-92



P. S. Begunov
Center of LED and Optoelectronic Technologies of National Academy of Sciences of Belarus
Belarus
PG student, researcher


Y. V. Trofimov
Center of LED and Optoelectronic Technologies of National Academy of Sciences of Belarus
Belarus
PhD., director


G. K. Zhavnerko
IZOVAC Technologies, Ltd.
Belarus
PhD.


References

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3. Yapici M. K., Farhat I. UV-LED exposure system for low-cost photolithography. Proc. SPIE. 2014; 104-109.

4. Kim J., Paik S.-J., Herrault F., Allen M. G. UV-LED lithography for 3-D high aspect ratio microstructure patterning. Solid-State Sensors, Actuators, and Microsystems Workshop. Hilton Head Island, USA, June 3–7, 2012; 481-484.

5. Reznikova E. F., Morh J., Hein H. Deep photo-lithography characterization of SU-8 resist layers. Microsystem Technol. 2005; 11(Is. 4-5): 282-291.

6. Yoshihiko M., Masahiro K., Suguru N. Development and future of ultraviolet light-emitting diodes: UV-LED will replace the UV lamp. Semicond. Sci. Technol. 2014; 29: 084004.

7. Pramod Sh., Khan M.Z, Choubey A.K. LED Revolution: Deep UV LED. IRJET. 2019; 6(5): 6486-6489.


Review

For citations:


Cheliapin A.E., Begunov P.S., Trofimov Y.V., Zhavnerko G.K. LED ULTRAVIOLET EXPOSURE UNIT WITH ADJUSTABLE EXPOSURE TIME. Doklady BGUIR. 2019;(7 (125)):46-50. (In Russ.) https://doi.org/10.35596/1729-7648-2019-125-7-46-50

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This work is licensed under a Creative Commons Attribution 4.0 License.


ISSN 1729-7648 (Print)
ISSN 2708-0382 (Online)