Low-temperature plasma magnetron discharge
Abstract
The article investigates a low-temperature plasma of the magnetron discharge of a device used for the synthesis of dielectric films by reactive cathode sputtering. The aim of the study is to determine the temperature characteristics of plasma particles and a sputtered substance, as well as the mechanism for the formation of a chemical bond between sputtered atoms and active gas molecules. A study of the composition and energy parameters of the plasma, as well as the chemical composition of the particles obtained by sputtering, was carried out by a spectroscopic method. The quantitative composition was determined by a mass spectrometer to determine the composition of the sputtered particles.
About the Authors
I. Sh. Nevliudov
Kharkiv national university of radioelectronics
Ukraine
Ukraine
D.Sci, professor, head of computer-integrated technologies, automation and mechatronics department
D. V. Gurin
Kharkiv national university of radioelectronics
Ukraine
Ukraine
D.Sci, professor of computer-integrated technologies, automation and mechatronics department
V. N. Gurin
Kharkiv national university of radioelectronics
Ukraine
Ukraine
Gurin Dmytro Valer'evich - PG student of computer-integrated technologies, automation and mechatronics department
61166, Ukraine, Kharkiv, Science ave., 14
tel. +38-057-702-14-86
K. L. Khrustalev
Kharkiv national university of radioelectronics
Ukraine
Ukraine
PhD, senior lecturer of computerintegrated technologies, automation and mechatronics department
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Review
For citations:
Nevliudov I.Sh., Gurin D.V., Gurin V.N., Khrustalev K.L. Low-temperature plasma magnetron discharge. Doklady BGUIR. 2018;(8):93-100. (In Russ.)
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