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Simulation of the processes of the electrons transfer in the semiconductor structure based on graphene

Abstract

The results of modeling of electron transfer processes in a three-dimensional semiconductor structure containing a single layer of graphene using the Monte-Carlo method are presented. The use of graphene, which has a high mobility of charge carriers, high thermal conductivity and a number of other positive properties, is promising for the creation of new semiconductor devices with good output characteristics . As a result of modeling, the dependences of the velocity, average energy, mobility, diffusion coefficient on the structure length and electric field intensity in a semiconductor structure containing a graphene layer and a region of a 4H-SiC silicon carbide material are obtained.

About the Authors

V. V. Murav'ev
Belarusian state university of informatics and radioelectronics
Belarus
D.Sci,  professor


V. N. Mishchenka
Belarusian state university of informatics and radioelectronics
Belarus

Mishchenka Valery Nickolaevich - PhD., associate professor 

220013, Republic of Belarus, Minsk, P. Brovka st., 6

tel. +375-17-293-80-70



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For citations:


Murav'ev V.V., Mishchenka V.N. Simulation of the processes of the electrons transfer in the semiconductor structure based on graphene. Doklady BGUIR. 2018;(8):55-62. (In Russ.)

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ISSN 1729-7648 (Print)
ISSN 2708-0382 (Online)