Rapid thermal treatment robotics unit for creation of electronic equipment devices
Abstract
The design specific features of the rapid thermal treatment automated unit for silicon wafers with the diameter of 100 mm are described. For preheating the unit uses the halogen lamps with a tungsten spiral of KGT 220-2000-3 in the quantity of 12 pieces, which ensure the wafer heating up to 1200 ºC with the temperature build-up rate of 10–150 ºC/s during 0.1–600 s. The annealing process is envisaged both in vacuum and in the various gaseous media. The production capacity of the unit with consideration of the wafer loading, creation of vacuum in the chamber, inflow into the chamber of the required gas, thermal treatment as per the preset program and the unloading process is ≤ 60 wafers/hour.
About the Authors
V. A. Saladukha
JSC «INTEGRAL» – holding managing company «INTEGRAL»
Belarus
PhD, general manager
Belarus
PhD, general manager
V. A. Pilipenko
JSC «INTEGRAL» – holding managing company «INTEGRAL»
Belarus
Belarus
Pilipenka Uladzimir Aleksandrovich - D.Sci, professor, corresponding member of the National academy of sciences of Belarus, deputy director of science development of state center «Belmicroanalysis»
220108, Republic of Belarus, Minsk, Kazintsa st., 121A
tel. +375-17-212-37-41
V. P. Yakovlev
LLC «Prospective innovation technologies»
Belarus
PhD, head
Belarus
PhD, head
References
1. Equipment for the pulse thermal treatment of materials of the semiconductor electronics with the intense non-coherent light / V.E. Borisenko [i dr.] // Zarubezhnaja jelektronnaja tehnika. 1985. № 6. S. 45–65.
2. Hebb J., Shajii A., Flynn M. Furnace-based rapid thermal proc // Solid State Technology. 2000. № 10. P. 155–164.
3. Equipment of the rapid thermal treatment in the technology of VLSI creation / Ja.I. Tochickij [i dr.] // Vestnik BGU. Ser. 1. 2000. №.1 S. 33–37.
4. Unit for the pulse annealing of the silicon wafers / L.D. Bujko [i dr.] // Jelektronnaja tehnika. Ser. 7. 1986. Vyp. 6. S. 41–43.
5. Evaluation of the irradiation uniformity of the semiconductor wafers in the chamber of the rapid thermal treatment unit / V.A. Pilipenko [i dr.] // Vestnik BGU. Ser. 1. 2013. № 1. S. 34–37.
Review
For citations:
Saladukha V.A., Pilipenko V.A., Yakovlev V.P. Rapid thermal treatment robotics unit for creation of electronic equipment devices. Doklady BGUIR. 2019;(4):92-97. (In Russ.)
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