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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">bsuir-913</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Статьи</subject></subj-group></article-categories><title-group><article-title></article-title><trans-title-group xml:lang="en"><trans-title>ANALYTICAL SOLUTION OF EQUATIONS SET DESCRIBING DIFFUSION OF POINT DEFECTS IN THE 2-LAYER SEMICONDUCTOR STRUCTURE</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Velichko</surname><given-names>O. I.</given-names></name></name-alternatives><email xlink:type="simple">velichkomail@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Aksenov</surname><given-names>V. V.</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff xml:lang="en" id="aff-1"><institution>Belarusian State University of Informatics and Radioelectronics</institution><country>Belarus</country></aff><pub-date pub-type="collection"><year>2017</year></pub-date><pub-date pub-type="epub"><day>03</day><month>06</month><year>2019</year></pub-date><volume>0</volume><issue>7</issue><fpage>20</fpage><lpage>24</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Velichko O.I., Aksenov V.V., 2019</copyright-statement><copyright-year>2019</copyright-year><copyright-holder xml:lang="ru">Velichko O.I., Aksenov V.V.</copyright-holder><copyright-holder xml:lang="en">Velichko O.I., Aksenov V.V.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/913">https://doklady.bsuir.by/jour/article/view/913</self-uri><trans-abstract xml:lang="en"><p>The boundary-value problem on impurity and point defect diffusion in the 2-layer semiconductor structure was formulated and analyzed. The analytical solution of the set of equations describing diffusion of intrinsic point defects was obtained for the case of the constant coefficients of these equations. Calculation of the typical distribution of point defects in the 2-layer structure was carried out.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>silicon</kwd><kwd>SiGe</kwd><kwd>impurity</kwd><kwd>defect</kwd><kwd>diffusion equation</kwd><kwd>analytical solution</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Kononchuk O., Nguye B.-Y. Silicon-On-Insulator (SOI) Technology: Manufacture and Applications. Elsevier, 2014. 496 p.</mixed-citation><mixed-citation xml:lang="en">Kononchuk O., Nguye B.-Y. Silicon-On-Insulator (SOI) Technology: Manufacture and Applications. 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