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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">bsuir-692</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Статьи</subject></subj-group></article-categories><title-group><article-title></article-title><trans-title-group xml:lang="en"><trans-title>THE EFFECT OF SURFACTANTS ON SUPERCONFORMAL DEPOSITION OF ELECTROLESS COMPOSITES IN NANOSCALE PATTERNS</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="western" xml:lang="en"><surname>Bogush</surname><given-names>V. A.</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff xml:lang="en" id="aff-1"><institution>Belarusian State University of Informatics and Radioelectronics</institution><country>Belarus</country></aff><pub-date pub-type="collection"><year>2016</year></pub-date><pub-date pub-type="epub"><day>03</day><month>06</month><year>2019</year></pub-date><volume>0</volume><issue>5</issue><fpage>97</fpage><lpage>101</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Bogush V.A., 2019</copyright-statement><copyright-year>2019</copyright-year><copyright-holder xml:lang="ru">Bogush V.A.</copyright-holder><copyright-holder xml:lang="en">Bogush V.A.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/692">https://doklady.bsuir.by/jour/article/view/692</self-uri><trans-abstract xml:lang="en"><p>Electroless plating of metal composites has been proposed as a promising method for metallization of high aspect ratio trenches for micro- and nanoelectronics and microelectromechanical systems application. Deposition of Ag(W) electroless films was performed from ammoniate silver solution to fill deep damascene trenches. Polyethylene glycol (PEG) with molecular weight of 400, 1500 and 6000, RE-610 and Triton X-100 were studied as an additives in the plating bath for superconformal deposition. The deposition rate, resistivity, grain size and the trench filling behaviour were studied as a function of the additives concentration and deposition temperature using Scanning Electron Microscopy (SEM) cross section study. The PEG with molecular mass about 1500 was found to provide superconformal Ag(W) electroless growth in nanometre wide trenches.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>electroless deposition surfactant</kwd><kwd>microelectronics metallization</kwd><kwd>metal composite thin film</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Shacham-Diamand Y., Croitoru N., Inberg A. et al. Alternative materials for ULSI and MEMS metallization. Microelectronic packaging. / Ed. by M. Datta, T. Osaka, J.W. Schultze. CRC Press, 2005.</mixed-citation><mixed-citation xml:lang="en">Shacham-Diamand Y., Croitoru N., Inberg A. et al. Alternative materials for ULSI and MEMS metallization. Microelectronic packaging. / Ed. by M. Datta, T. Osaka, J.W. Schultze. 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