Впервые разработана, теоретически обоснована и экспериментально подтверждена концепция использования наносетчатых пленок алюминия в качестве прозрачных проводящих покрытий. Предлагаемый метод позволяет формировать однородные по площади наносетчатые пленки алюминия с прозрачностью до 85% и эффективным поверхностным сопротивлением менее 50 Ом/ð.
Nanomeshy aluminum film is the promising alternative to a tin-doped indium oxide film (ITO) as transparent conductive electrodes. In this paper we describe the fabrication of a nanomeshy aluminum film by electrochemical anodization of aluminum deposited by magnetron sputtering on a glass substrate. The process of anodization is strictly controlled by the characteristic changes of process parameters, followed by selective chemical etching of aluminum oxide. We proposed the model for a nanomeshy Al film and calculated numerically the dependences of their optical transmittance and surface resistance on the characteristic dimensions of the network structure. The proposed method allows fabricating the uniform and stable nanomeshy aluminum film with transparency up to 80% with less than 50 Ohm/ð resistance.
The authors declare that there are no conflicts of interest present.