<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.35596/1729-7648-2025-23-5-20-26</article-id><article-id custom-type="elpub" pub-id-type="custom">bsuir-4203</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Статьи</subject></subj-group></article-categories><title-group><article-title>Лазерно-активированные фотохимические процессы формирования тонкопленочных систем микроэлектроники</article-title><trans-title-group xml:lang="en"><trans-title>Laser-Activated Photochemical Processes of Formation of Thin-Film Systems of Microelectronics</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Купо</surname><given-names>А. Н.</given-names></name><name name-style="western" xml:lang="en"><surname>Kupo</surname><given-names>A. N.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Купо Александр Николаевич, канд. техн. наук, доц., нач. центра информационных технологий, </p><p>246019, Гомель, ул. Советская, 102, корп. 5.</p><p>Тел.: +375 29 630-32-62.</p><p> </p></bio><bio xml:lang="en"><p>Kupo Aliaksandr, Cand. Sci. (Tech.), Associate Professor, Head of the Center for Information Technologies, </p><p>102, Bld. 5, Sovetskaya St., Gomel, 246019.</p><p>Tel.: +375 29 630-32-62.</p></bio><email xlink:type="simple">kupo@gsu.by</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Гомельский государственный университет имени Франциска Скорины</institution></aff><aff xml:lang="en"><institution>Francisk Skorina Gomel State University</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2025</year></pub-date><pub-date pub-type="epub"><day>29</day><month>10</month><year>2025</year></pub-date><volume>23</volume><issue>5</issue><fpage>20</fpage><lpage>26</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Купо А.Н., 2025</copyright-statement><copyright-year>2025</copyright-year><copyright-holder xml:lang="ru">Купо А.Н.</copyright-holder><copyright-holder xml:lang="en">Kupo A.N.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/4203">https://doklady.bsuir.by/jour/article/view/4203</self-uri><abstract><p>Представлены результаты исследования лазерно-активированных процессов электрохимического осаждения функциональных тонкопленочных субмикронных токопроводящих структур с использованием цианистых электролитов. Исследовано воздействие на цианистые электролиты лазерного излучения с длинами волн λ = 600–200 нм, которое приводит к активной диссоциации соединений видов KiMe(CN)j, Mei(CN)j, KiMei(CN)j. Это способствует локальному росту градиента концентрации активных электрохимических частиц и обуславливает увеличение локальной скорости электрохимического осаждения в целом. Проанализировано влияние на указанные процессы таких параметров, как интенсивность лазерного излучения, коэффициент поглощения лазерного излучения электролитом (эффективное сечение поглощения) и квантовый выход диссоциации, которые определяются составом электролита и селективностью лазерного воздействия.</p></abstract><trans-abstract xml:lang="en"><p>The article presents the results of a study of laser-assisted electrochemical deposition of functional thinfilm submicron conductive structures using cyanide electrolytes. The effect of laser radiation with wavelengths of  λ = 600–200 nm on cyanide electrolytes was investigated. This radiation leads to the active dissociation of compounds of the KiMe(CN)j, Mei(CN)j, and KiMei(CN)j types. This promotes a local increase in the concentration gradient of active electrochemical species and causes an increase in the local rate of electrochemical deposition as a whole. The influence of such parameters as laser radiation intensity, the absorption coefficient of laser radiation by the electrolyte (effective absorption cross-section), and the dissociation quantum yield, which are determined by the composition of the electrolyte and the selectivity of the laser irradiation, on these processes was analyzed.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>лазерные фотохимические процессы</kwd><kwd>цианистые электролиты</kwd><kwd>лазерно-активированное электрохимическое осаждение</kwd></kwd-group><kwd-group xml:lang="en"><kwd>laser photochemical processes</kwd><kwd>cyanide electrolytes</kwd><kwd>laser-activated electrochemical deposition</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Купо, А. Н. Лазерная технология интенсификации гальванического осаждения функциональных покрытий / А. Н. Купо, А. А. Хмыль, В. Л. Ланин // Технологии в электронной промышленности. 2016. № 8. С. 42–46.</mixed-citation><mixed-citation xml:lang="en">Kupo A. N., Khmyl A. A., Lanin V. L. (2016) Laser Technology of Intensification of Galvanic Deposition of Functional Coatings. Technology in the Electronics Industry. (8), 42–46 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Photochemistry (Definition of Terms) [Electronic Resource] // Chemical Engineering Matters. Mode of access: https://chemicalengineeringmatters.wordpress.com/2014/12/17/photochemistry-definition-ofterms/. Date of access: 26.08.2025.</mixed-citation><mixed-citation xml:lang="en">Photochemistry (Definition of Terms). Chemical Engineering Matters. Available: https://chemicalengineeringmatters.wordpress.com/2014/12/17/photochemistry-definition-of-terms/ (26 August 2025).</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Upadhyay, Sh. Photochemical Reaction and Applications in Organic Synthesis / Sh. Upadhyay, J. Kumar // ICBC. 2021. Vol. 1, No 4. DOI: 10.33552/ICBC.2021.01.000520.</mixed-citation><mixed-citation xml:lang="en">Upadhyay Sh., Kumar. J. (2021) Photochemical Reaction and Applications in Organic Synthesis. ICBC. 1 (4). DOI: 10.33552/ICBC.2021.01.000520.</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">Купо, А. Н. Фотохимический механизм стимуляции процесса электрохимической обработки материалов / А. Н. Купо // Известия Гомельского государственного университета имени Ф. Скорины. 2009. № 4. С. 123–131.</mixed-citation><mixed-citation xml:lang="en">Kupo A. N. (2009) Photochemical Mechanism of Stimulation of the Process of Electrochemical Processing of Materials. News of the F. Skorina Gomel State University. (4), 123–131 (in Russian).</mixed-citation></citation-alternatives></ref><ref id="cit5"><label>5</label><citation-alternatives><mixed-citation xml:lang="ru">Solve Nonstiff Differential Equations – Medium Order Method [Electronic Resource] // MATLAB Help Center. Mode of access: https://www.mathworks.com/help/matlab/ref/ode45.html. Date of access: 20.08.2025.</mixed-citation><mixed-citation xml:lang="en">Solve Nonstiff Differential Equations – Medium Order Method. MATLAB Help Center. Available: https:// www.mathworks.com/help/matlab/ref/ode45.html (20 August 2025).</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
