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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.35596/1729-7648-2023-21-2-14-20</article-id><article-id custom-type="elpub" pub-id-type="custom">bsuir-3595</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ЭЛЕКТРОНИКА, РАДИОФИЗИКА, РАДИОТЕХНИКА, ИНФОРМАТИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>ELECTRONICS, RADIOPHYSICS, RADIOENGINEERING, INFORMATICS</subject></subj-group></article-categories><title-group><article-title>Резисторная модель слоистых пленочных структур</article-title><trans-title-group xml:lang="en"><trans-title>Resistor Model of Layered Film Structures</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ван</surname><given-names>Тунг Фам</given-names></name><name name-style="western" xml:lang="en"><surname>Van</surname><given-names>Tung Pham</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ван Тунг Фам, аспирант кафедры микро- и наноэлектроники</p><p>220013, г. Минск, ул. П. Бровки, 6</p></bio><bio xml:lang="en"><p>Van Tung Pham Postgraduate at the Department of Micro- and Nanoelectronics</p><p>220013, Minsk, P. Brovki St., 6</p></bio><email xlink:type="simple">v.tu2103@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Чубенко</surname><given-names>Е. Б.</given-names></name><name name-style="western" xml:lang="en"><surname>Chubenko</surname><given-names>E. B.</given-names></name></name-alternatives><bio xml:lang="ru"><p>к. т. н., доцент, доцент кафедры микро- и наноэлектроники</p><p>Минск</p></bio><bio xml:lang="en"><p>Cand. of Sci., Associate Professor, Associate Professor at the Department of Micro and Nanoelectronics</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Борисенко</surname><given-names>В. Е.</given-names></name><name name-style="western" xml:lang="en"><surname>Borisenko</surname><given-names>V. E.</given-names></name></name-alternatives><bio xml:lang="ru"><p>д. ф.-м. н., профессор, профессор кафедры микро- и наноэлектроники</p></bio><bio xml:lang="en"><p>Dr. of Sci. (Phys. and Math.), Professor, Professor at the Department of Micro- and Nanoelectronics</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Белорусский государственный университет информатики и радиоэлектроники</institution></aff><aff xml:lang="en"><institution>Belarusian State University of Informatics and Radioelectronics</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2023</year></pub-date><pub-date pub-type="epub"><day>23</day><month>04</month><year>2023</year></pub-date><volume>21</volume><issue>2</issue><fpage>14</fpage><lpage>20</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Ван Т., Чубенко Е.Б., Борисенко В.Е., 2023</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="ru">Ван Т., Чубенко Е.Б., Борисенко В.Е.</copyright-holder><copyright-holder xml:lang="en">Van T., Chubenko E.B., Borisenko V.E.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/3595">https://doklady.bsuir.by/jour/article/view/3595</self-uri><abstract><p>Предлагается электрические свойства пленочных структур, состоящих из двумерных слоев, образованных нанокристаллическими зернами полупроводника, моделировать эквивалентной схемой. В данной схеме соединенные определенным образом резисторы показывают сопротивление токопроводящих каналов в металлических контактах к ним, материала зерен, межзеренных и межслоевых потенциальных барьеров. Численным моделированием установлено, что распределение тока по площади контактов существенно неоднородно. Плотность тока на периферии контактов может в 3–6 раз превышать этот показатель в их центре. Величины же локальных токов и их распределение по объему слоистых пленок зависят от их зернистости, количества слоев и электронных свойств потенциальных барьеров между зернами и слоями. </p></abstract><trans-abstract xml:lang="en"><p>Electric properties of film structures consisting of two-dimensional layers, composed by nanocrystalline grains of a semiconductor are proposed to be modeled with an equivalent scheme, in which resistors indicate electrical resistance of current channels in metallic contacts, grain material, potential barriers between grains and layers. Numerical simulation within the model has shown that there is a nonuniform current distribution over the area of the contacts. Current density at their edges can be 3–6 times higher than in the center. Local currents and their distribution in the film bulk are determined by the grain structure of the film, number of the layers, electronic properties of the barriers between grains and layers. </p></trans-abstract><kwd-group xml:lang="ru"><kwd>моделирование</kwd><kwd>слоистая пленка</kwd><kwd>эквивалентная схема</kwd><kwd>резистор</kwd><kwd>потенциальный  барьер</kwd><kwd>нитрид углерода</kwd><kwd>нанокристалл</kwd></kwd-group><kwd-group xml:lang="en"><kwd>modeling</kwd><kwd>layered film</kwd><kwd>equivalent scheme</kwd><kwd>resistor</kwd><kwd>potential barrier</kwd><kwd>carbon nitride</kwd><kwd>nanocrystal</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Novoselov K. S. (2005) Two-Dimensional Atomic Crystals. Proc. Natl. Acad. Sci. 102 (30), 10451–10453. DOI: 10.1073/pnas.0502848102.</mixed-citation><mixed-citation xml:lang="en">Novoselov K. S. (2005) Two-Dimensional Atomic Crystals. Proc. Natl. Acad. Sci. 102 (30), 10451–10453. DOI: 10.1073/pnas.0502848102.</mixed-citation></citation-alternatives></ref><ref id="cit2"><label>2</label><citation-alternatives><mixed-citation xml:lang="ru">Wang Y., Wang L., Zhang X., Liang X., Feng Y., Feng W. (2021) Two-Dimensional Nanomaterials with Engineered Bandgap: Synthesis, Properties, Applications. Nano Today. 37 (101059). DOI: 10.1016/j. nantod.2020.101059.</mixed-citation><mixed-citation xml:lang="en">Wang Y., Wang L., Zhang X., Liang X., Feng Y., Feng W. (2021) Two-Dimensional Nanomaterials with Engineered Bandgap: Synthesis, Properties, Applications. Nano Today. 37 (101059). DOI: 10.1016/j. nantod.2020.101059.</mixed-citation></citation-alternatives></ref><ref id="cit3"><label>3</label><citation-alternatives><mixed-citation xml:lang="ru">Wang Y., Liu L., Ma T., Zhang Y., Huang H. (2021) 2D Graphitic Carbon Nitride for Energy Conversion and Storage. Adv. Funct. Mater. 31 (34), 2102540 (36 pages). DOI: 10.1002/adfm.202102540.</mixed-citation><mixed-citation xml:lang="en">Wang Y., Liu L., Ma T., Zhang Y., Huang H. (2021) 2D Graphitic Carbon Nitride for Energy Conversion and Storage. Adv. Funct. Mater. 31 (34), 2102540 (36 pages). DOI: 10.1002/adfm.202102540.</mixed-citation></citation-alternatives></ref><ref id="cit4"><label>4</label><citation-alternatives><mixed-citation xml:lang="ru">Chubenko E. B., Kovalchuk N. G., Komissarov I. V., Borisenko V. E. (2022) Chemical Vapor Deposition of 2D Crystallized g-C3N4 Layered Films. J. Phys. Chem. C. 126 (9), 4710–4714. DOI: 10.1021/acs.jpcc.1c10561.</mixed-citation><mixed-citation xml:lang="en">Chubenko E. B., Kovalchuk N. G., Komissarov I. V., Borisenko V. E. (2022) Chemical Vapor Deposition of 2D Crystallized g-C3N4 Layered Films. J. Phys. Chem. C. 126 (9), 4710–4714. DOI: 10.1021/acs.jpcc.1c10561.</mixed-citation></citation-alternatives></ref></ref-list><fn-group><fn fn-type="conflict"><p>The authors declare that there are no conflicts of interest present.</p></fn></fn-group></back></article>
