<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.35596/1729-7648-2023-21-2-5-13</article-id><article-id custom-type="elpub" pub-id-type="custom">bsuir-3594</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ЭЛЕКТРОНИКА, РАДИОФИЗИКА, РАДИОТЕХНИКА, ИНФОРМАТИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>ELECTRONICS, RADIOPHYSICS, RADIOENGINEERING, INFORMATICS</subject></subj-group></article-categories><title-group><article-title>Чувствительность к метану нанокомпозитных слоев SnO2(Ag) после импульсного лазерного облучения</article-title><trans-title-group xml:lang="en"><trans-title>Methane Sensitivity of Pulsed Laser Treated SnO2(Ag) Nanocomposite Layers</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Прокопьев</surname><given-names>С. Л.</given-names></name><name name-style="western" xml:lang="en"><surname>Prakopyeu</surname><given-names>S. L.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Прокопьев Станислав Леонидович, старший преподаватель кафедры физической электроники и нанотехнологий</p><p>220064, г. Минск, ул. Курчатова, 5</p><p>Тел.: +375 29 276-16-90</p></bio><bio xml:lang="en"><p>Prakopyeu Stanislau Leanidavich, Senior Lecturer at the Department of Physical Electronics and Nanotechnology</p><p>220064, Republic of Belarus, Kurchatova St., 5</p><p>Tel.: +375 29 276-16-90</p></bio><email xlink:type="simple">prokopyev@bsu.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Гайдук</surname><given-names>П. И.</given-names></name><name name-style="western" xml:lang="en"><surname>Gaiduk</surname><given-names>P. I.</given-names></name></name-alternatives><bio xml:lang="ru"><p>д. ф.-м. н., профессор кафедры физической электроники и нанотехнологий</p><p>Минск</p></bio><bio xml:lang="en"><p>Dr. of Sci. (Phys. and Math.), Professor at the Department of Physical Electronics and Nanotechnology</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Белорусский государственный университет</institution></aff><aff xml:lang="en"><institution>Belarusian State University</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2023</year></pub-date><pub-date pub-type="epub"><day>23</day><month>04</month><year>2023</year></pub-date><volume>21</volume><issue>2</issue><fpage>5</fpage><lpage>13</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Прокопьев С.Л., Гайдук П.И., 2023</copyright-statement><copyright-year>2023</copyright-year><copyright-holder xml:lang="ru">Прокопьев С.Л., Гайдук П.И.</copyright-holder><copyright-holder xml:lang="en">Prakopyeu S.L., Gaiduk P.I.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/3594">https://doklady.bsuir.by/jour/article/view/3594</self-uri><abstract><p>Исследованы газочувствительные свойства слоев SnO2(Ag), полученных последовательным магнетронным распылением мишени Sn + Ag, окислением слоев Sn0,65Ag0,35 при температуре 650 °С в течение 30 мин и модифицированных импульсами лазерного излучения с плотностью энергии W = 1,5–3,2 Дж/см2. Методами просвечивающей электронной микроскопии и просвечивающей электронной дифракции установлено, что слои Sn0,65Ag0,35 и SnO2(Ag) являются нанокомпозитными со средним размером зерен 100–150 нм. В зависимости от режимов их получения слои содержат зерна с фазовым составом: тетрагональная фаза β-Sn с орторомбической фазой Ag3Sn (Sn0,65Ag0,35, магнетронное распыление) и тетрагональная фаза SnO2 (касситерит) с гранецентрированной кубической структурой Ag (SnO2(Ag), термическое окисление). Чувствительность S слоев SnO2(Ag) к метану определялась при T = 200–360 °C в атмосфере воздуха с содержанием метана в диапазоне CCH4 = 2000–20 000 ppm. Показано, что импульсная лазерная обработка приводит к увеличению чувствительности S слоев SnO2(Ag) к метану до 12 % по сравнению с исходными слоями SnO2(Ag). </p></abstract><trans-abstract xml:lang="en"><p>This paper reports on the gas sensitivity of SnO2(Ag) layers, consequently formed by magnetron sputtering of Sn + Ag target, oxidation of Sn0.65Ag0.35 layers at the temperature of 650 °С within 30 min and modified by laser radiation pulses at energy density of W = 1.5–3.2 J/cm2. Using transmission electron microscopy and transmission electron diffraction it was found, that Sn0.65Ag0.35 and SnO2(Ag) layers are nanocomposite with average grain size of 100–150 nm. Sn0.65Ag0.35 and SnO2(Ag) layers contain grains of the following phase composition: a tetragonal β-Sn with an orthorhombic Ag3Sn (Sn0.65Ag0.35, magnetron sputtering) and a tetragonal SnO2 (cassiterite) with a face-centered cubic Ag structure (SnO2(Ag), thermal oxidation). The sensitivity of SnO2(Ag) layers with respect to 2000–20 000 ppm methane in the air was obtained from sensitivity S measurements at T = 200–360 °C. It is shown that pulsed laser annealing of SnO2(Ag) layers results in up to 12 % increase of sensitivity of SnO2(Ag) layers to methane in comparison with the initial SnO2(Ag) layers. </p></trans-abstract><kwd-group xml:lang="ru"><kwd>нанокомпозитные слои SnO2(Ag)</kwd><kwd>магнетронное распыление</kwd><kwd>импульсная лазерная обработка</kwd><kwd>термическое окисление</kwd><kwd>газочувствительность</kwd><kwd>метан</kwd></kwd-group><kwd-group xml:lang="en"><kwd>nanocomposite SnO2(Ag) layers</kwd><kwd>magnetron sputtering</kwd><kwd>pulsed laser annealing</kwd><kwd>thermal oxidation</kwd><kwd>gas sensitivity</kwd><kwd>methane</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Pan, S. 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