<?xml version="1.0" encoding="UTF-8"?>
<!DOCTYPE article PUBLIC "-//NLM//DTD JATS (Z39.96) Journal Publishing DTD v1.3 20210610//EN" "JATS-journalpublishing1-3.dtd">
<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id pub-id-type="doi">10.35596/1729-7648-2021-19-8-68-71</article-id><article-id custom-type="elpub" pub-id-type="custom">bsuir-3248</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ЭЛЕКТРОНИКА, РАДИОФИЗИКА, РАДИОТЕХНИКА, ИНФОРМАТИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>ELECTRONICS, RADIOPHYSICS, RADIOENGINEERING, INFORMATICS</subject></subj-group></article-categories><title-group><article-title>Influence of radiation exposure on the properties of dielectric layers based on anodic aluminum oxide</article-title><trans-title-group xml:lang="en"><trans-title>Influence of radiation exposure on the properties of dielectric layers based on anodic aluminum oxide</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Biran</surname><given-names>S. A.</given-names></name><name name-style="western" xml:lang="en"><surname>Biran</surname><given-names>S. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Sergey А. Biran – Deputy Dean of the Faculty of Radioengineering and Electronics </p><p>220013, Republic of Belarus, Minsk, P. Brovka St., 6, Belarusian State University of Informatics and Radioelectronics</p></bio><email xlink:type="simple">biran@bsuir.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Korotkevich</surname><given-names>D. A.</given-names></name><name name-style="western" xml:lang="en"><surname>Korotkevich</surname><given-names>D. A.</given-names></name></name-alternatives><bio xml:lang="en"><p>Dmitriy А. Korotkevich – Assistant at the Department of Electronics  </p><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Korotkevich</surname><given-names>A. V.</given-names></name><name name-style="western" xml:lang="en"><surname>Korotkevich</surname><given-names>A. V.</given-names></name></name-alternatives><bio xml:lang="en"><p>Alexander V. Korotkevich – PhD., Associate Professor, Dean of the Faculty</p><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Garifov</surname><given-names>K. V.</given-names></name><name name-style="western" xml:lang="en"><surname>Garifov</surname><given-names>K. V.</given-names></name></name-alternatives><bio xml:lang="en"><p>Kirill V. Garifov –  Undergraduate at           the Department of Micro- and Nanoelectronics</p><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Dashkevich</surname><given-names>A. D.</given-names></name><name name-style="western" xml:lang="en"><surname>Dashkevich</surname><given-names>A. D.</given-names></name></name-alternatives><bio xml:lang="en"><p>Anton D. Dashkevich – Undergraduate at  the Department of Micro- and Nanoelectronics</p><p>Minsk</p></bio><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Belarusian State University of Informatics and Radioelectronics</institution></aff><aff xml:lang="en"><institution>Belarusian State University of Informatics and Radioelectronics</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2021</year></pub-date><pub-date pub-type="epub"><day>03</day><month>01</month><year>2022</year></pub-date><volume>19</volume><issue>8</issue><fpage>68</fpage><lpage>71</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Biran S.A., Korotkevich D.A., Korotkevich A.V., Garifov K.V., Dashkevich A.D., 2022</copyright-statement><copyright-year>2022</copyright-year><copyright-holder xml:lang="ru">Biran S.A., Korotkevich D.A., Korotkevich A.V., Garifov K.V., Dashkevich A.D.</copyright-holder><copyright-holder xml:lang="en">Biran S.A., Korotkevich D.A., Korotkevich A.V., Garifov K.V., Dashkevich A.D.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/3248">https://doklady.bsuir.by/jour/article/view/3248</self-uri><abstract><p>Devices that are used in the aerospace industry must operate in extreme conditions, so it is important to understand how the properties of materials change under the influence of radiation and low temperatures. Anodic aluminum oxide, due to its mechanical and dielectric properties, is widely used in electronic devices with a high degree of integration. Radiation exposure can lead to degradation of the electrophysical parameters of dielectric films and can also change their chemical composition. The methods for studying the effect of radiation exposure on the dielectric properties of films are shown in this article. The research has been carried out and the results of the influence of α-particles on the dielectric properties of a porous film of anodic aluminum oxide during the influence of low temperature are presented.</p></abstract><trans-abstract xml:lang="en"><p>Devices that are used in the aerospace industry must operate in extreme conditions, so it is important to understand how the properties of materials change under the influence of radiation and low temperatures. Anodic aluminum oxide, due to its mechanical and dielectric properties, is widely used in electronic devices with a high degree of integration. Radiation exposure can lead to degradation of the electrophysical parameters of dielectric films and can also change their chemical composition. The methods for studying the effect of radiation exposure on the dielectric properties of films are shown in this article. The research has been carried out and the results of the influence of α-particles on the dielectric properties of a porous film of anodic aluminum oxide during the influence of low temperature are presented.</p></trans-abstract><kwd-group xml:lang="en"><kwd>anodic alumina</kwd><kwd>radiation exposure</kwd><kwd>porous film</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Lee W., Park S.-J. 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