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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">bsuir-1159</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>ЭЛЕКТРОНИКА, РАДИОФИЗИКА, РАДИОТЕХНИКА, ИНФОРМАТИКА</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="en"><subject>ELECTRONICS, RADIOPHYSICS, RADIOENGINEERING, INFORMATICS</subject></subj-group></article-categories><title-group><article-title>Формирование электрохимическим методом композитных материалов на основе оксида цинка и меди</article-title><trans-title-group xml:lang="en"><trans-title>Electrochemical forming of composite materials based on zinc and copper oxide</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Ткачёнок</surname><given-names>Н. М.</given-names></name><name name-style="western" xml:lang="en"><surname>Tkachyonok</surname><given-names>N. M.</given-names></name></name-alternatives><bio xml:lang="ru"><p>Ткачёнок Никита Михайлович, инженер-электроник НИЛ 4.3 НИЧ, магистрант кафедры микро- и наноэлектроники </p><p>220013, г. Минск, ул. П. Бровки, 6</p><p>тел. +375-29-293-88-54</p></bio><bio xml:lang="en"><p>Tkachyonok Nikita Mikhailovich, electronic engineer R&amp;D Laboratory 4.3 BSUIR, undergraduate of the Department of Micro and Nanoelectronics </p><p>220013, Minsk, P. Brovka str., 6</p><p>tel. + 375-29-293-88-54 </p></bio><email xlink:type="simple">fransresto@gmail.com</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Чубенко</surname><given-names>Е. Б.</given-names></name><name name-style="western" xml:lang="en"><surname>Cubenko</surname><given-names>E. B.</given-names></name></name-alternatives><bio xml:lang="ru"><p>к.т.н., ведущий научный сотрудник НИЛ 4.3 НИЧ</p><p>г. Минск </p></bio><bio xml:lang="en"><p>PhD, Leading Researcher R&amp;D Laboratory 4.3 </p><p>Minsk </p></bio><xref ref-type="aff" rid="aff-2"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Бондаренко</surname><given-names>В. П.</given-names></name><name name-style="western" xml:lang="en"><surname>Bondarenko</surname><given-names>V. P.</given-names></name></name-alternatives><bio xml:lang="ru"><p>к.т.н., доцент, заведующий НИЛ 4.3 НИЧ</p><p>г. Минск </p></bio><bio xml:lang="en"><p>PhD, Associate Professor, Head of R&amp;D Laboratory 4.3 </p><p>Minsk </p></bio><xref ref-type="aff" rid="aff-2"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Белорусский государственный университет информатики и радиоэлектроники, НИЛ 4.3</institution></aff><aff xml:lang="en"><institution>Belarusian State University of Informatics and Radioelectronics</institution></aff></aff-alternatives><aff-alternatives id="aff-2"><aff xml:lang="ru"><institution>Белорусский государственный университет информатики и радиоэлектроники</institution></aff><aff xml:lang="en"><institution>Belarusian State University of Informatics and Radioelectronics</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2020</year></pub-date><pub-date pub-type="epub"><day>21</day><month>07</month><year>2020</year></pub-date><volume>18</volume><issue>5</issue><fpage>17</fpage><lpage>25</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Ткачёнок Н.М., Чубенко Е.Б., Бондаренко В.П., 2020</copyright-statement><copyright-year>2020</copyright-year><copyright-holder xml:lang="ru">Ткачёнок Н.М., Чубенко Е.Б., Бондаренко В.П.</copyright-holder><copyright-holder xml:lang="en">Tkachyonok N.M., Cubenko E.B., Bondarenko V.P.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/1159">https://doklady.bsuir.by/jour/article/view/1159</self-uri><abstract><p>Методом электрохимического осаждения на подложках из монокристаллического кремния получены структуры на основе ZnO и Cu, представляющие собой поликристаллический композит, состоящий из кристаллического ZnO с кристаллографической ориентацией (002) и (101), легированного Cu, и кристаллитов металлической Cu. При исследовании полученных пленок методом рамановской спектроскопии было подтверждено образование кристаллического ZnO. Было получено, что на спектрах комбинационного рассеяния всех образцов присутствует полоса с максимумом, относящаяся к колебательной моде ZnO 2А1(LO). Также на спектрах каждого из образцов присутствует полоса в области 649 см-1, не связанная с колебательными модами решетки собственного кристаллического ZnO. Показано, что при увеличении плотности тока осаждения в диапазоне 2–10 мА/см2 концентрация Cu в материале снижается, при этом уменьшается количество кластеров Cu, но возрастает степень легирования ZnO ионами Cu. Композиты на основе ZnO демонстрируют широкую полосу фотолюминесценции в диапазоне длин волн 500–700 нм, связанную с наличием вакансий и междоузельных атомов кислорода в кристаллической решетке. При плотности тока осаждения 5 мА/см2 наблюдается коротковолновой сдвиг полосы фотолюминесценции, обусловленный легированием Cu, так как в запрещенной зоне создаются примесные уровни, связанные с присутствием Cu в пленках ZnO. Наблюдалось изменение интенсивности излучения при плотности тока 10 мА/см2, что обусловлено большей толщиной полученных пленок. Результаты исследования могут быть использованы при разработке технологии изготовления оптоэлектронных и фотовольтаических приборов, фотокаталитических покрытий на основе ZnO.</p></abstract><trans-abstract xml:lang="en"><p>Structures based on ZnO and Cu, which are a polycrystalline composite consisting of crystalline ZnO with a crystallographic orientation of (002) and (101) doped with Cu and crystalline metallic Cu, were obtained by electrochemical deposition on substrates of single crystal origin. In the study of the obtained films by Raman spectroscopy, the forming of crystalline ZnO was confirmed. ZnO 2A1 (LO), also in the spectra of each of the bands present in the 649 cm-1 region, not related to the vibrating lattice modes of the intrinsic crystalline ZnO. It was shown that with an increase in the deposition current density in the range of 2–10 mA/cm2, the concentration of Cu in the material weakens, while the number of Cu clusters decreases, but the degree of doping of ZnO with Cu ions increases. ZnO-based composites exhibit a broad photoluminescence band in the long wavelength range of 500–700 nm, related with vacancies and interstitial oxygen atoms in the crystal lattice. At a current density of 5 mA / cm2, short-wavelength shifts of the photoluminescence bands are observed, due to the doping of Cu, since impurity levels are created in the band gap associated with the presence of Cu in ZnO films. A change in the radiation intensities was observed at a current density of 10 mA/cm2, which is due to the greater thickness of the obtained films. The results can be used to develop the manufacturing technology of optoelectronic and photovoltaic devices, photocatalytic coatings based on ZnO.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>электрохимическое осаждение</kwd><kwd>нанокомпозитные материалы</kwd><kwd>рентгеновская&#13;
дифрактометрия</kwd><kwd>рамановская спектроскопия</kwd><kwd>фотолюминесценция</kwd></kwd-group><kwd-group xml:lang="en"><kwd>electrochemical deposition</kwd><kwd>nanocomposite materials</kwd><kwd>X-ray diffractometry</kwd><kwd>Raman spectroscopy</kwd><kwd>photoluminescence</kwd></kwd-group><funding-group><funding-statement xml:lang="ru">Данная работа выполнена в рамках задания 2.1.02 ГПНИ Республики Беларусь «Фотоника, опто- и микроэлектроника», задания 2.21 ГПНИ Республики Беларусь «Физическое материаловедение, новые материалы и технологии». Авторы выражают благодарность Д.В. Жигулину за проведение растровой электронной микроскопии и ЭДР-спектроскопии образцов.</funding-statement><funding-statement xml:lang="en">This work was carried out in the framework of assignment 2.1.02 of the State Scientific Inspection of the Republic of Belarus “Photonics, Optoelectronics and Microelectronics”, assignment 2.21 of the State Scientific Inspection of the Republic of Belarus “Physical Materials Science, New Materials and Technologies”. The authors also thank D.V. Zhigulin for conducting scanning electron microscopy and EDR spectroscopy of samples.</funding-statement></funding-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Özgür Ü., Alivov Ya.I., Liu C., Teke A., Reshchikov M.A., Dogan S., Avrutin V., Cho S.J., Morkoc H. Comprehensive review of ZnO materials and devices. J. Appl. Phys. 2005;98:1 103. 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