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<article article-type="research-article" dtd-version="1.3" xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink" xmlns:xsi="http://www.w3.org/2001/XMLSchema-instance" xml:lang="ru"><front><journal-meta><journal-id journal-id-type="publisher-id">bsuir</journal-id><journal-title-group><journal-title xml:lang="ru">Доклады БГУИР</journal-title><trans-title-group xml:lang="en"><trans-title>Doklady BGUIR</trans-title></trans-title-group></journal-title-group><issn pub-type="ppub">1729-7648</issn><issn pub-type="epub">2708-0382</issn><publisher><publisher-name>БГУИР</publisher-name></publisher></journal-meta><article-meta><article-id custom-type="elpub" pub-id-type="custom">bsuir-1079</article-id><article-categories><subj-group subj-group-type="heading"><subject>Research Article</subject></subj-group><subj-group subj-group-type="section-heading" xml:lang="ru"><subject>Статьи</subject></subj-group></article-categories><title-group><article-title>МОДЕЛИРОВАНИЕ ПРОЦЕССОВ ПЕРЕНОСА ЭЛЕКТРОНОВ В ПОЛУПРОВОДНИКОВОЙ СТРУКТУРЕ ИЗ КАРБИДА КРЕМНИЯ</article-title><trans-title-group xml:lang="en"><trans-title>Modeling of electrons transfer in silicon carbide semiconductor structures</trans-title></trans-title-group></title-group><contrib-group><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Муравьев</surname><given-names>В. В.</given-names></name><name name-style="western" xml:lang="en"><surname>Murav'ev</surname><given-names>V. V.</given-names></name></name-alternatives><email xlink:type="simple">muravyev@bsuir.by</email><xref ref-type="aff" rid="aff-1"/></contrib><contrib contrib-type="author" corresp="yes"><name-alternatives><name name-style="eastern" xml:lang="ru"><surname>Мищенко</surname><given-names>В. Н.</given-names></name><name name-style="western" xml:lang="en"><surname>Mishchenka</surname><given-names>V. N.</given-names></name></name-alternatives><email xlink:type="simple">noemail@neicon.ru</email><xref ref-type="aff" rid="aff-1"/></contrib></contrib-group><aff-alternatives id="aff-1"><aff xml:lang="ru"><institution>Белорусский государственный университет информатики и радиоэлектроники</institution></aff><aff xml:lang="en"><institution>Belarusian state university of informatics and radioelectronics</institution></aff></aff-alternatives><pub-date pub-type="collection"><year>2017</year></pub-date><pub-date pub-type="epub"><day>03</day><month>06</month><year>2019</year></pub-date><volume>0</volume><issue>2</issue><fpage>53</fpage><lpage>57</lpage><permissions><copyright-statement>Copyright &amp;#x00A9; Муравьев В.В., Мищенко В.Н., 2019</copyright-statement><copyright-year>2019</copyright-year><copyright-holder xml:lang="ru">Муравьев В.В., Мищенко В.Н.</copyright-holder><copyright-holder xml:lang="en">Murav'ev V.V., Mishchenka V.N.</copyright-holder><license xml:lang="ru" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>Данная работа распространяется под лицензией Creative Commons Attribution 4.0.</license-p></license><license xml:lang="en" license-type="creative-commons-attribution" xlink:href="https://creativecommons.org/licenses/by/4.0/" xlink:type="simple"><license-p>This work is licensed under a Creative Commons Attribution 4.0 License.</license-p></license></permissions><self-uri xlink:href="https://doklady.bsuir.by/jour/article/view/1079">https://doklady.bsuir.by/jour/article/view/1079</self-uri><abstract><p>Приведены результаты моделирования процессов переноса электронов в трехмерной структуре из 4H-SiC карбида кремния с использованием метода Монте-Карло. Использование материала 4H-SiC по сравнению с другими модификациями карбида кремния позволяет получить ряд преимуществ при изготовлении приборов и последующей эксплуатации. Получены зависимости средней дрейфовой скорости, средней энергии электронов, подвижности электронов, а также коэффициента диффузии от напряженности электрического поля.</p></abstract><trans-abstract xml:lang="en"><p>The results of the simulation of electron transfer processes in the three-dimensional structure of 4H-SiC silicon carbide are presented using the Monte Carlo method. The dependence of the average drift velocity, average energy and electron mobility of electrons and the diffusion coefficient from the electric field are obtained.</p></trans-abstract><kwd-group xml:lang="ru"><kwd>карбид кремния</kwd><kwd>процессы переноса электронов</kwd><kwd>метод Монте-Карло</kwd></kwd-group><kwd-group xml:lang="en"><kwd>silicon carbide</kwd><kwd>electron transfer processes</kwd><kwd>Monte Carlo method</kwd></kwd-group></article-meta></front><back><ref-list><title>References</title><ref id="cit1"><label>1</label><citation-alternatives><mixed-citation xml:lang="ru">Silicon carbide high-power devices / C.E. Weitzel et. al. // IEEE Transaction Electron Devices. 1996. Vol. 43, P. 1732-1741.</mixed-citation><mixed-citation xml:lang="en">Silicon carbide high-power devices / C.E. Weitzel et. al. // IEEE Transaction Electron Devices. 1996. 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